An upgraded ultra-high vacuum magnetron-sputtering system for high-versatility and software-controlled deposition

Magnetron sputtering is a widely used physical vapor deposition technique. Reactive for the of, e.g, oxides, nitrides and carbides. In fundamental research, versatility essential when designing or upgrading chamber. Furthermore, automated systems are norm in industrial production, but relatively uncommon laboratory-scale primarily research. Combining automatization computerized control with required research constitutes challenge designing, developing, laboratory systems. The present article provides detailed description of design lab-scale chamber magnetron metallic, oxide, nitride oxynitride films controls, dc pulsed bias, combined coil to enhance plasma density near substrate. LabVIEW software (provided as Supplementary Information) has been developed high degree hardware processes logging process details.